High Resolution Inductively Coupled Plasma - Mass Spectrometry (ICP-MS)

Often, the preferred measurement choice for trace metals analysis is Inductively Coupled Plasma (ICP) coupled with optical emission detection (ICP-OES). In cases when ultra-trace quantification is desired (in the part-per-trillion range), ICP-OES cannot provide the necessary sensitivity and ICP with Mass Spectrometry (MS) detection is needed. However, traditional quadruple based ICP-MS measurements can suffer from spectral interferences which result in complicated or even incorrect measurements.

To combat these issues, Intertek utilizes High Resolution-ICPMS, or magnetic sector ICPMS, to detect, identify and quantify analytes of interest without these limitations. This high-end analysis capability provides a means of definitively measuring ultra-trace metals content in a variety of materials where understanding ultra-trace metals contamination is important.

Applications:

• Evaluation of purity for ‘ultra-pure’ or semiconductor grade process chemicals
• Screening of residual metals in manufactured plastics such as organic electronics, medical devices
• Measurement of ultra-trace heavy metals (eg. Cr, Cd, Sb, Pb) in consumer and beauty products
• Catalyst poisoning
• Investigating contamination issues related to sub parts-per-trillion levels in complex matrices

Attributes

• Multi-element analysis across the periodic table
• Detection limits down to sub parts-per-trillion for select matrices
• Sample types include aqueous and organic solutions, solids, and gases
• Experiments carried out in a clean-room to minimize environmental contamination